News & Public Relations
ISMI 450 mm Program Moving to Next Stage in addition to existing NanoPhotonics metrology tools
Date: 26 Oct 2009The ISMI 450 mm wafer program is moving to a new stage, going beyond wafer handling to blanket film deposition and metrology, said ISMI 450 mm program manager Tom Jefferson. Speaking at the close of the ISMI Symposium in Austin, Texas, Jefferson said the program will install a wafer cleaning tool next week, and is sending out single-crystal test wafers to equipment suppliers.
David Lammers, News Editor -- Semiconductor International, 10/23/2009
Several hundred manufacturing experts gathered this week for the annual ISMI Symposium, organized by the International Sematech Manufacturing Initiative (ISMI, Austin). Jefferson, an Intel assignee to ISMI, told symposium participants that the 450 mm program is evolving to development of "the initial toolsets," including a wet wafer cleaning tool from Solid State Equipment Corp. (SSEC, Horsham, Pa.) that will be moved into the cleanroom in Austin next Wednesday. The SSEC tool will sit alongside existing NanoPhotonics AG (Mainz, Germany) particle-detection and edge-inspection metrology tools installed earlier this year.